Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
Reliable high work-function molybdenum dioxide synthesis via template-effect-utilizing atomic layer deposition for next-generation electrode applications
Controlling the crystallinity of HfO2 thin film using the surface energy-driven phase stabilization and template effect
Achieving High Dielectric Constants in Tetragonal Single-Phase ZrHfO2 Thin Films through the Atomic Layer Deposition Process Using a Mixed Precursor
Y-doped HfO2 deposited by atomic layer deposition using a cocktail precursor for DRAM capacitor dielectric application
The Significance on Structural Modulation of Buffer and Gate Insulator for ALD Based InGaZnO TFT Applications
An Empirical Investigation on the Effect of Oxygen Vacancy in ZrO2Thin Film on the Frequency-Dependent Capacitance Degradation in the Metal-Insulator-Metal Capacitor
Plasma-enhanced atomic layer deposited HfO2 films using a novel heteroleptic cyclopentadienyl-based Hf precursor
Sustained complementary resistive switching capability deployed by structure-modulated electric field confinement of core-shell nanowires in a simple polymer composite
Improved Properties of the Atomic Layer Deposited Ru Electrode for Dynamic Random-Access Memory Capacitor Using Discrete Feeding Method
A visible-light phototransistor based on the heterostructure of ZnO and TiO2 with trap-assisted photocurrent generation
Improving the photodetection and stability of a visible-light QDs/ZnO phototransistorviaan Al2O3additional layer
Modulation of the adsorption chemistry of a precursor in atomic layer deposition to enhance the growth per cycle of a TiO2 thin film
Optimized Al-doped TiO2gate insulator for a metal-oxide-semiconductor capacitor on a Ge substrate
Highly sustainable mechanical/electrical resistance switching behaviors via one-dimensional Ag/TiO2 core-shell resistive switchable materials in flexible composite
Chemistry of ruthenium as an electrode for metal-insulator-metal capacitor application
Sustainable resistance switching performance from composite-type ReRAM device based on carbon Nanotube@Titania core?shell wires
Nanoscale surface engineering of a high-kZrO(2)/SiO(2)gate insulator for a high performance ITZO TFTviaplasma-enhanced atomic layer deposition
Comparative Study on the Gate-Induced Electrical Instability of p-Type SnO Thin-Film Transistors with SiO(2)and Al2O3/SiO(2)Gate Dielectrics
Atomic layer deposition of Ru thin films using (2,4-dimethyloxopentadienyl)(ethylcyclopentadienyl)Ru and the effect of ammonia treatment during the deposition
Recent advances in the understanding of high-k dielectric materials deposited by atomic layer deposition for dynamic random-access memory capacitor applications
Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
The impact of plasma-enhanced atomic layer deposited ZrSiOx insulators on low voltage operated In-Sn-Zn-O thin film transistors
Substrate Effects on the Growth Behavior of Atomic-Layer-Deposited Ru Thin Films Using RuO4 Precursor and N-2/H-2 Mixed Gas
Scaling the Equivalent Oxide Thickness by Employing a TiO2 Thin Film on a ZrO2?Al2O3-Based Dielectric for Further Scaling of Dynamic Random Access Memory
Optimization of a SiOx/SiNxOyCz multilayer structure for a reliable gas diffusion barrier via low-temperature plasma-enhanced atomic layer deposition
Controlling the Electrical Characteristics of ZrO2/Al2O3/ZrO2 Capacitors by Adopting a Ru Top Electrode Grown via Atomic Layer Deposition
Improved performance and stability of In-Sn-Zn-O thin film transistor by introducing a meso-crystalline ZrO2 high-k gate insulator
Controlling the Current Conduction Asymmetry of HfO2 Metal-Insulator-Metal Diodes by Interposing Al2O3 Layer